The rapid adoption of AI is driving unprecedented demand for advanced chips and lithography, processes that historically utilize PFAS. This growth poses a significant environmental risk, as PFAS in lithography rinses can potentially contaminate municipal water systems if not effectively controlled at the source, impacting public health and the environment.
To address this, the UC San Diego IEEE Student Branch team partnered with We Impact Corp/Clearwater Innovation to develop a bench-scale, closed-loop treatment train for lithography rinses. This system employs two-stage foam fractionation to concentrate PFAS into a small foamate stream, followed by polishing with a PFAS-selective anion-exchange resin. The highly enriched foamate is then destroyed using electrochemical oxidation, with low-cost automation ensuring stable operation.
The primary goal is to significantly reduce the volume of PFAS requiring destruction, thereby preventing its release into municipal systems. This innovative approach offers a compact and effective solution for source control.
This project was made possible by $4110 in funding from EPICS in IEEE.